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Selective Metal‐vapor Deposition on Organic Surfaces
Author(s) -
Tsujioka Tsuyoshi
Publication year - 2016
Publication title -
the chemical record
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.61
H-Index - 78
eISSN - 1528-0691
pISSN - 1527-8999
DOI - 10.1002/tcr.201500235
Subject(s) - chemical vapor deposition , materials science , deposition (geology) , combustion chemical vapor deposition , amorphous solid , hybrid physical chemical vapor deposition , nanotechnology , thin film , optoelectronics , carbon film , chemistry , organic chemistry , paleontology , sediment , biology
Selective metal‐vapor deposition signifies that metal‐vapor atoms are deposited on a hard organic surface, but not on a soft (low glass transition temperature, low T g ) surface. In this paper, we introduce the origin, extension, and applications of selective metal‐vapor deposition. An amorphous photochromic diarylethene film shows light‐controlled selective metal‐vapor deposition, which is caused by a large T g change based on photoisomerization, but various organic surfaces, including organic crystal and polymers, can be utilized for achieving selective metal‐vapor deposition. Various applications of selective metal‐vapor deposition, including cathode patterning of organic light‐emitting devices, micro‐thin‐film fuses, multifunctional diffraction gratings, in‐plane electrical bistability for memory devices, and metal‐vapor integration, have been demonstrated.