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Zinc Oxide: From Precursor Chemistry to Gas Sensors: Plasma‐Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications (Small 22/2020)
Author(s) -
Mai Lukas,
Mitschker Felix,
Bock Claudia,
Niesen Alessia,
Ciftyurek Engin,
Rogalla Detlef,
Mickler Johannes,
Erig Matthias,
Li Zheshen,
Awakowicz Peter,
Schierbaum Klaus,
Devi Anjana
Publication year - 2020
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.202070122
Subject(s) - zinc , atomic layer deposition , deposition (geology) , layer (electronics) , materials science , inorganic chemistry , oxide , oxygen , plasma , chemical engineering , nanotechnology , chemistry , organic chemistry , metallurgy , paleontology , physics , quantum mechanics , sediment , engineering , biology
In article number 1907506, Anjana Devi and co‐workers introduce a new, nonpyrophoric zinc precursor for plasma enhanced atomic layer deposition (PEALD) of zinc oxide (ZnO). Here, oxygen plasma is used to react with adsorbed zinc precursor on chemiresistor structures to form highly pure ZnO which is used effectively as a selective gas sensing layer for NO 2 in a functional gas sensor device.