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Hydrogen Evolution Reaction: Wafer‐Scale and Low‐Temperature Growth of 1T‐WS 2 Film for Efficient and Stable Hydrogen Evolution Reaction (Small 6/2020)
Author(s) -
Kim HyeongU,
Kanade Vinit,
Kim Mansu,
Kim Ki Seok,
An ByeongSeon,
Seok Hyunho,
Yoo Hocheon,
Chaney Lindsay E.,
Kim SeungIl,
Yang CheolWoong,
Yeom Geun Yong,
Whang Dongmok,
Lee JaeHyun,
Kim Taesung
Publication year - 2020
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.202070033
Subject(s) - nanocrystalline material , electrocatalyst , hydrogen , materials science , catalysis , chemical vapor deposition , wafer , chemical engineering , durability , grain boundary , nanotechnology , electrochemistry , chemistry , metallurgy , microstructure , composite material , organic chemistry , engineering , electrode
In article number 1905000, Jae‐Hyun Lee, Taesung Kim, and co‐workers demonstrate a uniform and stable 1T phase of WS 2 (1T‐WS 2 ) film on 4‐inch wafer using a plasma‐enhanced chemical vapor deposition system. The nanocrystalline 1T‐WS 2 , containing high density of grain boundary, is utilized as an electrocatalyst for the hydrogen evolution reaction and exhibits efficient catalytic activity and high durability.