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Controllable Synthesis of Wafer‐Scale Graphene Films: Challenges, Status, and Perspectives
Author(s) -
Jiang Bei,
Wang Shiwei,
Sun Jingyu,
Liu Zhongfan
Publication year - 2021
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.202008017
Subject(s) - graphene , wafer , nanotechnology , materials science , chemical vapor deposition , scale (ratio) , scalability , electronics , computer science , engineering , physics , electrical engineering , quantum mechanics , database
The availability of high‐quality, large‐scale, and single‐crystal wafer‐scale graphene films is fundamental for key device applications in the field of electronics, optics, and sensors. Synthesis determines the future: unleashing the full potentials of such emerging materials relies heavily upon their tailored synthesis in a scalable fashion, which is by no means an easy task to date. This review covers the state‐of‐the‐art progress in the synthesis of wafer‐scale graphene films by virtue of chemical vapor deposition (CVD), with a focus on main challenges and present status. Particularly, prevailing synthetic strategies are highlighted on a basis of the discussion in the reaction kinetics and gas‐phase dynamics during CVD process. Perspectives with respect to key opportunities and promising research directions are proposed to guide the future development of wafer‐scale graphene films.