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Water Lithography: “Print‐to‐pattern”: Silk‐Based Water Lithography (Small 47/2018)
Author(s) -
Liu Zhen,
Zhou Zhitao,
Zhang Shaoqing,
Sun Long,
Shi Zhifeng,
Mao Ying,
Liu Keyin,
Tao Tiger H.
Publication year - 2018
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.201870223
Subject(s) - lithography , nanotechnology , materials science , wafer , next generation lithography , stencil lithography , planar , x ray lithography , resist , optoelectronics , electron beam lithography , computer science , computer graphics (images) , layer (electronics)
In article number 1802953 , Tiger H. Tao and co‐workers report a silk‐based water lithography technique. This work introduces a wafer‐scale, all‐water‐based, chemical‐free, biopatterning method that allows for rapid prototyping of biologically functional devices and interfaces in an extremely fast fashion, and importantly, in ambient conditions, on both planar and curved surfaces.