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Photonics: Enhanced Performance of MoS 2 Photodetectors by Inserting an ALD‐Processed TiO 2 Interlayer (Small 5/2018)
Author(s) -
Pak Yusin,
Park Woojin,
Mitra Somak,
Sasikala Devi Assa Aravindh,
Loganathan Kalaivanan,
Kumaresan Yogeenth,
Kim Yonghun,
Cho Byungjin,
Jung GunYoung,
Hussain Muhammad M.,
Roqan Iman S.
Publication year - 2018
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.201870022
Subject(s) - photodetector , responsivity , materials science , optoelectronics , atomic layer deposition , photonics , layer (electronics) , electrode , nanotechnology , chemistry
In article number 1703176 , Iman S. Roqan and co‐workers report the use of an atomic layer‐deposited TiO 2 interlayer between exfoliated MoS 2 and electrode to enhance the performance of MoS 2 photodetectors. The TiO 2 interlayer is inserted through 20 cycled‐atomic layer depositions, leading to significant enhancements in the photo‐responsivity and response‐recovery time.