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Sub‐5 nm Metal Nanogaps: Physical Properties, Fabrication Methods, and Device Applications
Author(s) -
Yang Yang,
Gu Changzhi,
Li Junjie
Publication year - 2019
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.201804177
Subject(s) - fabrication , nanotechnology , materials science , plasmon , coulomb blockade , optoelectronics , transistor , voltage , electrical engineering , engineering , medicine , alternative medicine , pathology
Sub‐5 nm metal nanogaps have attracted widespread attention in physics, chemistry, material sciences, and biology due to their physical properties, including great plasmon‐enhanced effects in light–matter interactions and charge tunneling, Coulomb blockade, and the Kondo effect under an electrical stimulus. These properties especially meet the needs of many cutting‐edge devices, such as sensing, optical, molecular, and electronic devices. However, fabricating sub‐5 nm nanogaps is still challenging at the present, and scaled and reliable fabrication, improved addressability, and multifunction integration are desired for further applications in commercial devices. The aim of this work is to provide a comprehensive overview of sub‐5 nm nanogaps and to present recent advancements in metal nanogaps, including their physical properties, fabrication methods, and device applications, with the ultimate aim to further inspire scientists and engineers in their research.