A Tunneling Dielectric Layer Free Floating Gate Nonvolatile Memory Employing Type‐I Core–Shell Quantum Dots as Discrete Charge‐Trapping/Tunneling Centers

A nonvolatile memory with a floating gate structure is fabricated using ZnSe@ZnS core–shell quantum dots as discrete charge‐trapping/tunneling centers. Systematical investigation reveals that the spontaneous recovery of the trapped charges in the ZnSe core can be effectively avoided by the type‐I energy band structure of the quantum dots. The surface oleic acid ligand surrounding the quantum dots can also play a role of energy barrier to prevent unintentional charge recovery. The device based on the quantum dots demonstrates a large memory window, stable retention, and good endurance. What is more, integrating charge‐trapping and tunneling components into one quantum dot, which is solution synthesizable and processible, can largely simplify the processing of the floating gate nonvolatile memory. This research reveals the promising application potential of type‐I core–shell nanoparticles as the discrete charge‐trapping/tunneling centers in nonvolatile memory in terms of performance, cost, and flexibility.