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Scalable 3D Nanoparticle Trap for Electron Microscopy Analysis
Author(s) -
Sun Xingwu,
Berenschot Erwin J. W.,
Veltkamp HenkWillem,
Gardeniers Han J. G. E.,
Tas Niels R.
Publication year - 2018
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.201803283
Subject(s) - materials science , wafer , lithography , nanotechnology , miniaturization , resist , nanoscopic scale , electron beam lithography , nanoparticle , transmission electron microscopy , scanning electron microscope , optoelectronics , layer (electronics) , composite material
Arrays of nanoscale pyramidal cages embedded in a silicon nitride membrane are fabricated with an order of magnitude miniaturization in the size of the cages compared to previous work. This becomes possible by combining the previously published wafer‐scale corner lithography process with displacement Talbot lithography, including an additional resist etching step that allows the creation of masking dots with a size down to 50 nm, using a conventional 365 nm UV source. The resulting pyramidal cages have different entrance and exit openings, which allows trapping of nanoparticles within a predefined size range. The cages are arranged in a well‐defined array, which guarantees traceability of individual particles during post‐trapping analysis. Gold nanoparticles with a size of 25, 150, and 200 nm are used to demonstrate the trapping capability of the fabricated devices. The traceability of individual particles is demonstrated by transferring the transmission electron microscopy (TEM) transparent devices between scanning electron microscopy and TEM instruments and relocating a desired collection of particles.