Premium
Templated Sub‐100‐nm‐Thick Double‐Gyroid Structure from Si‐Containing Block Copolymer Thin Films
Author(s) -
Aissou Karim,
Mumtaz Muhammad,
Portale Giuseppe,
Brochon Cyril,
Cloutet Eric,
Fleury Guillaume,
Hadziioannou Georges
Publication year - 2017
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.201603777
Subject(s) - gyroid , materials science , copolymer , thin film , annealing (glass) , polystyrene , nanostructure , substrate (aquarium) , self assembly , chemical engineering , polymer chemistry , nanotechnology , composite material , polymer , oceanography , geology , engineering
The directed self‐assembly of diblock copolymer chains (poly(1,1‐dimethyl silacyclobutane)‐ block ‐polystyrene, PDMSB‐ b ‐PS) into a thin film double gyroid structure is described. A decrease of the kinetics of a typical double‐wave pattern formation is reported within the 3D‐nanostructure when the film thickness on mesas is lower than the gyroid unit cell. However, optimization of the solvent‐vapor annealing process results in very large grains (over 10 µm²) with specific orientation (i.e., parallel to the air substrate) and direction (i.e., along the groove direction) of the characteristic (211) plane, demonstrated by templating sub‐100‐nm‐thick PDMSB‐ b ‐PS films.