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Block Copolymers: Laterally Ordered Sub‐10 nm Features Obtained From Directed Self‐Assembly of Si‐Containing Block Copolymer Thin Films (Small 48/2015)
Author(s) -
Rho Yecheol,
Aissou Karim,
Mumtaz Muhammad,
Kwon Wonsang,
Pécastaings Gilles,
Mocuta Cristian,
Stanecu Stefan,
Cloutet Eric,
Brochon Cyril,
Fleury Guillaume,
Hadziioannou Georges
Publication year - 2015
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.201570288
Subject(s) - copolymer , materials science , lithography , thin film , self assembly , block (permutation group theory) , inscribed figure , nanotechnology , optoelectronics , polymer , composite material , combinatorics , geometry , mathematics
On page 6377, K. Aissou, G. Hadziioannou, and co‐workers report the directed self‐assembly of Si‐containing block copolymer thin films on laser‐inscribed azobenene‐containing layers. These are shown to be useful to produce laterally ordered sub‐10 nm features. One potential application for this processing technology is towards next‐generation lithography, for instance, highly ordered 2D arrays of out‐of‐plane cylinders with an areal density of 2.9 teradots inch −2 are demonstrated.