Premium
Patterning: Atomic‐Level Sculpting of Crystalline Oxides: Toward Bulk Nanofabrication with Single Atomic Plane Precision (Small 44/2015)
Author(s) -
Jesse Stephen,
He Qian,
Lupini Andrew R.,
Leonard Donovan N.,
Oxley Mark P.,
Ovchinnikov Oleg,
Unocic Raymond R.,
Tselev Alexander,
FuentesCabrera Miguel,
Sumpter Bobby G.,
Pennycook Stephen J.,
Kalinin Sergei V.,
Borisevich Albina Y.
Publication year - 2015
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.201570264
Subject(s) - nanolithography , materials science , transmission electron microscopy , amorphous solid , scanning transmission electron microscopy , epitaxy , nanotechnology , crystallography , optics , fabrication , chemistry , physics , medicine , alternative medicine , pathology , layer (electronics)
On page 5895, Q. He, A. Y. Borisevich, and co‐workers describe how an aberration‐corrected e‐beam in a scanning transmission electron microscope can be used to crystallize amorphous complex oxides with atomic plane precision. Using this control system, epitaxial growth of SrTiO 3 is achieved to pattern text onto a 90 × 25 nm area, as shown in the image. Each feature shown is about 20 unit cells (about 8 nm) wide.