Liquid‐Phase Beam Pen Lithography | Zendy

He Shu | Zendy; Xie Zhuang | Zendy; Park Daniel J. | Zendy; Liao Xing | Zendy; Brown Keith A. | Zendy; Chen PengCheng | Zendy; Zhou Yu | Zendy; Schatz George C. | Zendy; Mirkin Chad A. | Zendy

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Liquid‐Phase Beam Pen Lithography

Author(s) -

He Shu,

Xie Zhuang,

Park Daniel J.,

Liao Xing,

Brown Keith A.,

Chen PengCheng,

Zhou Yu,

Schatz George C.,

Mirkin Chad A.

Publication year - 2016

Publication title -

small

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 3.785

H-Index - 236

eISSN - 1613-6829

pISSN - 1613-6810

DOI - 10.1002/smll.201502666

Subject(s) - lithography , substrate (aquarium) , nanotechnology , computer science , phase (matter) , materials science , aperture (computer memory) , liquid phase , physics , chemistry , optoelectronics , organic chemistry , oceanography , acoustics , thermodynamics , geology

Beam pen lithography (BPL) in the liquid phase is evaluated. The effect of tip‐substrate gap and aperture size on patterning performance is systematically investigated. As a proof‐of‐concept experiment, nanoarrays of nucleotides are synthesized using BPL in an organic medium, pointing toward the potential of using liquid phase BPL to perform localized photochemical reactions that require a liquid medium.

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