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Liquid‐Phase Beam Pen Lithography
Author(s) -
He Shu,
Xie Zhuang,
Park Daniel J.,
Liao Xing,
Brown Keith A.,
Chen PengCheng,
Zhou Yu,
Schatz George C.,
Mirkin Chad A.
Publication year - 2016
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.201502666
Subject(s) - lithography , substrate (aquarium) , nanotechnology , computer science , phase (matter) , materials science , aperture (computer memory) , liquid phase , physics , chemistry , optoelectronics , organic chemistry , oceanography , acoustics , thermodynamics , geology
Beam pen lithography (BPL) in the liquid phase is evaluated. The effect of tip‐substrate gap and aperture size on patterning performance is systematically investigated. As a proof‐of‐concept experiment, nanoarrays of nucleotides are synthesized using BPL in an organic medium, pointing toward the potential of using liquid phase BPL to perform localized photochemical reactions that require a liquid medium.