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Laterally Ordered Sub‐10 nm Features Obtained From Directed Self‐Assembly of Si‐Containing Block Copolymer Thin Films
Author(s) -
Rho Yecheol,
Aissou Karim,
Mumtaz Muhammad,
Kwon Wonsang,
Pécastaings Gilles,
Mocuta Cristian,
Stanecu Stefan,
Cloutet Eric,
Brochon Cyril,
Fleury Guillaume,
Hadziioannou Georges
Publication year - 2015
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.201500439
Subject(s) - copolymer , materials science , azobenzene , methyl methacrylate , thin film , self assembly , methacrylate , block (permutation group theory) , polymer chemistry , chemical engineering , composite material , nanotechnology , polymer , geometry , mathematics , engineering
Laterally ordered sub‐10 nm features are produced from the directed self‐assembly of poly(1,1‐dimethyl silacyclobutane)‐ block ‐poly(methyl methacrylate) (PDMSB‐ b ‐PMMA) thin films on sinusoidal azobenzene‐containing patterns. The use of sinusoidal surface relief grating enables the formation of very large grain areas (over several µm 2 ) consisting of out‐of‐plane PMMA cylinders.