Laterally Ordered Sub‐10 nm Features Obtained From Directed Self‐Assembly of Si‐Containing Block Copolymer Thin Films | Zendy

Rho Yecheol | Zendy; Aissou Karim | Zendy; Mumtaz Muhammad | Zendy; Kwon Wonsang | Zendy; Pécastaings Gilles | Zendy; Mocuta Cristian | Zendy; Stanecu Stefan | Zendy; Cloutet Eric | Zendy; Brochon Cyril | Zendy; Fleury Guillaume | Zendy; Hadziioannou Georges | Zendy

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Laterally Ordered Sub‐10 nm Features Obtained From Directed Self‐Assembly of Si‐Containing Block Copolymer Thin Films

Author(s) -

Rho Yecheol,

Aissou Karim,

Mumtaz Muhammad,

Kwon Wonsang,

Pécastaings Gilles,

Mocuta Cristian,

Stanecu Stefan,

Cloutet Eric,

Brochon Cyril,

Fleury Guillaume,

Hadziioannou Georges

Publication year - 2015

Publication title -

small

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 3.785

H-Index - 236

eISSN - 1613-6829

pISSN - 1613-6810

DOI - 10.1002/smll.201500439

Subject(s) - copolymer , materials science , azobenzene , methyl methacrylate , thin film , self assembly , methacrylate , block (permutation group theory) , polymer chemistry , chemical engineering , composite material , nanotechnology , polymer , geometry , mathematics , engineering

Laterally ordered sub‐10 nm features are produced from the directed self‐assembly of poly(1,1‐dimethyl silacyclobutane)‐ block ‐poly(methyl methacrylate) (PDMSB‐ b ‐PMMA) thin films on sinusoidal azobenzene‐containing patterns. The use of sinusoidal surface relief grating enables the formation of very large grain areas (over several µm 2 ) consisting of out‐of‐plane PMMA cylinders.

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