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Self‐Assembly: Sacrificial‐Post Templating Method for Block Copolymer Self‐Assembly (Small 3/2014)
Author(s) -
Tavakkoli K. G. Amir,
Nicaise Samuel M.,
Han Adam F.,
Gotrik Kevin W.,
AlexanderKatz Alfredo,
Ross Caroline A.,
Berggren Karl K.
Publication year - 2014
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.201470017
Subject(s) - copolymer , materials science , polystyrene , self assembly , methyl methacrylate , substrate (aquarium) , nanoscopic scale , etching (microfabrication) , methacrylate , hexagonal crystal system , polymer chemistry , nanotechnology , chemical engineering , composite material , polymer , layer (electronics) , crystallography , chemistry , oceanography , geology , engineering
Block copolymer (BCP) thin films self‐assemble to form nanoscale patterns, as K. K. Berggren and co‐workers report on page 493. On a smooth substrate, the polystyrene‐ block ‐poly(dimethylsiloxane) copolymer forms randomly oriented inplane cylinders with a 35‐nm period (images on the left). A set of sacrifical nanoposts made of poly(methyl methacrylate) directed the self‐assembly to form (center top to bottom): square arrays of spheres or holes, and square and hexagonal meshes with bimodal hole‐size distributions. The posts and the polystyrene are removed by etching and the final pattern consists of oxidized poly(dimethylsiloxane)