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‘Bubble‐Free’ Electrochemical Delamination of CVD Graphene Films
Author(s) -
Cherian Christie Thomas,
Giustiniano Francesco,
MartinFernandez Iñigo,
Andersen Henrik,
Balakrishnan Jayakumar,
Özyilmaz Barbaros
Publication year - 2015
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.201402024
Subject(s) - bubble , graphene , materials science , delamination (geology) , nanotechnology , electrochemistry , graphene foam , graphene oxide paper , electrode , chemistry , mechanics , physics , paleontology , subduction , tectonics , biology
The production of large amounts of hydrogen bubbles, typical of electrochemical delamination methods based on the electrolysis of water, results in mechanical damage to graphene during the delamination, transfer, and drying steps. Here a novel ‘bubble‐free’ delamination method is introduced which exploits the electrochemical dissolution of native copper oxide at a potential lower than that required for the formation of hydrogen bubbles, enabling the production of defect‐free graphene stack.