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A General Route Towards Defect and Pore Engineering in Graphene
Author(s) -
Xie Guibai,
Yang Rong,
Chen Peng,
Zhang Jing,
Tian Xuezeng,
Wu Shuang,
Zhao Jing,
Cheng Meng,
Yang Wei,
Wang Duoming,
He Congli,
Bai Xuedong,
Shi Dongxia,
Zhang Guangyu
Publication year - 2014
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.201303671
Subject(s) - graphene , nanopore , materials science , fabrication , nanotechnology , graphene foam , graphene nanoribbons , porosity , etching (microfabrication) , membrane , plasma , plasma etching , composite material , chemistry , medicine , biochemistry , alternative medicine , physics , pathology , layer (electronics) , quantum mechanics
Defect engineering in graphene is important for tailoring graphene's properties thus applicable in various applications such as porous membranes and ultra‐capacitors. In this paper, we report a general route towards defect‐ and pore‐ engineering in graphene through remote plasma treatments. Oxygen plasma irradiation was employed to create homogenous defects in graphene with controllable density from a few to ≈10 3 (μm −2 ). The created defects can be further enlarged into nanopores by hydrogen plasma anisotropic etching with well‐defined pore size of a few nm or above. The achieved smallest nanopores are ≈2 nm in size, showing the potential for ultra‐small graphene nanopores fabrication.
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