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Direct Fabrication of Hexagonally Ordered Ridged Nanoarchitectures via Dual Interference Lithography for Efficient Sensing Applications
Author(s) -
Jeon Hwan Chul,
Jeon Tae Yoon,
Shim Tae Soup,
Yang SeungMan
Publication year - 2014
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.201302860
Subject(s) - materials science , photoresist , interference lithography , fabrication , lithography , nanotechnology , optoelectronics , homogeneity (statistics) , nanosphere lithography , nanolithography , medicine , alternative medicine , pathology , statistics , mathematics , layer (electronics)
Novel, large‐area uniform hexagonally‐ordered ridged nanoarchitectures (HORNs) can be fabricated using dual interference lithography derived from a novel prism and substrate beneath a spin‐coated photoresist (PR) film. The metallic HORN arrays provide tunable SERS effects with large‐scale sample homogeneity that depends on the number of stacks present along the z‐direction, which is determined by the PR film thickness. Furthermore, the HORN structures show significant potential for use in particle‐based or fluorescence‐based sensing platforms by forming a free suspension of ridged nanoparticles or achieving highly intensified fluorescence signals, respectively.