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Sacrificial‐Post Templating Method for Block Copolymer Self‐Assembly
Author(s) -
Tavakkoli K. G. Amir,
Nicaise Samuel M.,
Han Adam F.,
Gotrik Kevin W.,
AlexanderKatz Alfredo,
Ross Caroline A.,
Berggren Karl K.
Publication year - 2014
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.201301066
Subject(s) - copolymer , self assembly , materials science , nanoscopic scale , monolayer , nanostructure , lipid microdomain , nanotechnology , composite material , membrane , polymer , chemistry , biochemistry
A sacrificial‐post templating method is presented for directing block copolymer self‐assembly to form nanostructures consisting of monolayers and bilayers of microdomains. In this approach, the topographical post template is removed after self‐assembly and therefore is not incorporated into the final microdomain pattern. Arrays of nanoscale holes of different shapes and symmetries, including mesh structures and perforated lamellae with a bimodal pore size distribution, are produced. The ratio of the pore sizes in the bimodal distributions can be varied via the template pitch, and agrees with predictions of self consistent field theory.