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Resistless Nanoimprinting in Metal for Plasmonic Nanostructures
Author(s) -
Varghese Leo T.,
Fan Li,
Xuan Yi,
Tansarawiput Chookiat,
Kim Sangsik,
Qi Minghao
Publication year - 2013
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.201300168
Subject(s) - materials science , plasmon , nanostructure , metamaterial , nanotechnology , silicon , raman scattering , nanolithography , raman spectroscopy , optoelectronics , fabrication , optics , medicine , physics , alternative medicine , pathology
Metal nanostructures are the main building blocks of metamaterials and plasmonics which show many extraordinary properties not existing in nature. A simple and widely applicable method that can directly pattern metals with silicon molds without the need of resists, using pressures of <4 MPa and temperatures of 25–150 °C is reported. Three‐dimensional structures with smooth and vertical sidewalls, down to sub‐10 nm resolution, are generated in silver and gold films in a single patterning step. Using this nanopatterning scheme, large‐scale vivid images through extraordinary optical transmission and strong surface‐enhanced Raman scattering substrates are realized. Resistless nanoimprinting in metal (RNIM) is a new class of metal patterning that allows plasmonic nanostructures to be fabricated quickly, repeatedly, and at a low‐cost.