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Nanopatterning: Graphoepitaxy of Block‐Copolymer Self‐Assembly Integrated with Single‐Step ZnO Nanoimprinting (Small 10/2012)
Author(s) -
Kim Sarah,
Shin Dong Ok,
Choi DaeGeun,
Jeong JongRyul,
Mun Jeong Ho,
Yang YongBiao,
Kim Jaeup U.,
Kim Sang Ouk,
Jeong JunHo
Publication year - 2012
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.201290057
Subject(s) - materials science , copolymer , nanolithography , self assembly , nanotechnology , nanoscopic scale , template , nanostructure , thermal stability , polymer , chemical engineering , composite material , fabrication , medicine , alternative medicine , pathology , engineering
The cover image features a highly efficient nanolithography technique with a minimal number of processing steps, integrating directed block‐copolymer self‐assembly with single‐step ZnO nanoimprinting. Diverse shapes of the ZnO patterns are readily attainable by UV‐assisted, single‐step imprinting of sol–gel precursors. The ZnO provides high thermal stability and low line‐edge roughness, both of which are crucial for further directed blockcopolymer assembly. According to the ZnO trench shape, various self‐assembled nanoscale morphologies—such as surface‐parallel nanocylinder arrays, hierarchical nanopatterns of surface‐parallel and vertical cylinder arrays, and co‐axial nano‐ring arrays—can be formed in the graphoepitaxially assembled block‐copolymer thin films. For more information, please read the Full Paper “Graphoepitaxy of Block‐Copolymer Self‐Assembly Integrated with Single‐Step ZnO Nanoimprinting” by S. O. Kim, J.‐H. Jeong, and co‐workers, beginning on page 1563 .