Synthesis of Boron‐Doped Graphene Monolayers Using the Sole Solid Feedstock by Chemical Vapor Deposition | Zendy

Wang Huan | Zendy; Zhou Yu | Zendy; Wu Di | Zendy; Liao Lei | Zendy; Zhao Shuli | Zendy; Peng Hailin | Zendy; Liu Zhongfan | Zendy

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Synthesis of Boron‐Doped Graphene Monolayers Using the Sole Solid Feedstock by Chemical Vapor Deposition

Author(s) -

Wang Huan,

Zhou Yu,

Wu Di,

Liao Lei,

Zhao Shuli,

Peng Hailin,

Liu Zhongfan

Publication year - 2013

Publication title -

small

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 3.785

H-Index - 236

eISSN - 1613-6829

pISSN - 1613-6810

DOI - 10.1002/smll.201203021

Subject(s) - monolayer , chemical vapor deposition , graphene , materials science , boron , doping , chemical engineering , nanotechnology , deposition (geology) , organic chemistry , optoelectronics , chemistry , paleontology , sediment , engineering , biology

Substitutionally boron‐doped monolayer graphene film is grown on a large scale by using a sole phenylboronic acid as the source in a low‐pressure chemical vapor deposition system. The B‐doped graphene film is a homogeneous monolayer with high crystalline quality, which exhibits a stable p‐type doping behavior with a considerably high room‐temperature carrier mobility of about 800 cm 2 V −1 s −1 .

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