Large Area Resist‐Free Soft Lithographic Patterning of Graphene | Zendy

George Antony | Zendy; Mathew S. | Zendy; van Gastel Raoul | Zendy; Nijland Maarten | Zendy; Gopinadhan K. | Zendy; Brinks Peter | Zendy; Venkatesan T. | Zendy; ten Elshof Johan E. | Zendy

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Large Area Resist‐Free Soft Lithographic Patterning of Graphene

Author(s) -

George Antony,

Mathew S.,

van Gastel Raoul,

Nijland Maarten,

Gopinadhan K.,

Brinks Peter,

Venkatesan T.,

ten Elshof Johan E.

Publication year - 2013

Publication title -

small

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 3.785

H-Index - 236

eISSN - 1613-6829

pISSN - 1613-6810

DOI - 10.1002/smll.201201889

Subject(s) - resist , graphene , lithography , materials science , nanotechnology , soft lithography , substrate (aquarium) , graphene nanoribbons , photolithography , optoelectronics , fabrication , layer (electronics) , medicine , oceanography , alternative medicine , pathology , geology

Large area low‐cost patterning is a challenging problem in graphene research. A resist‐free, single‐step, large area and cost effective soft lithographic patterning strategy is presented for graphene. The technique is applicable on any arbitrary substrate that needs to be covered with a graphene film and provides a viable route to large‐area patterning of graphene for device applications.

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