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Large Area Resist‐Free Soft Lithographic Patterning of Graphene
Author(s) -
George Antony,
Mathew S.,
van Gastel Raoul,
Nijland Maarten,
Gopinadhan K.,
Brinks Peter,
Venkatesan T.,
ten Elshof Johan E.
Publication year - 2013
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.201201889
Subject(s) - resist , graphene , lithography , materials science , nanotechnology , soft lithography , substrate (aquarium) , graphene nanoribbons , photolithography , optoelectronics , fabrication , layer (electronics) , medicine , oceanography , alternative medicine , pathology , geology
Large area low‐cost patterning is a challenging problem in graphene research. A resist‐free, single‐step, large area and cost effective soft lithographic patterning strategy is presented for graphene. The technique is applicable on any arbitrary substrate that needs to be covered with a graphene film and provides a viable route to large‐area patterning of graphene for device applications.