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Pitch‐Tunable Size Reduction Patterning with a Temperature‐Memory Polymer
Author(s) -
Bae WonGyu,
Choi Jae Hoon,
Suh Kahp Y.
Publication year - 2013
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.201201554
Subject(s) - scalability , replica , reduction (mathematics) , computer science , polymer , materials science , service (business) , nanotechnology , database , composite material , visual arts , art , geometry , mathematics , economy , economics
A scalable and pitch‐tunable size reduction patterning method is introduced by exploiting the temperature memory effect of shape memory polymer and replica molding of UV‐curable materials.