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High‐Resolution, Large‐Area, Serial Fabrication of 3D Polymer Brush Structures by Parallel Dip‐Pen Nanodisplacement Lithography
Author(s) -
Zhou Xuechang,
Liu Zhilu,
Xie Zhuang,
Liu Xuqing,
Zheng Zijian
Publication year - 2012
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.201201544
Subject(s) - materials science , fabrication , lithography , polymer , template , nanotechnology , nanodot , nanolithography , brush , resolution (logic) , stencil lithography , optoelectronics , x ray lithography , resist , layer (electronics) , composite material , computer science , artificial intelligence , medicine , alternative medicine , pathology
Parallel dip‐pen nanodisplacement lithography (p‐DNL) is used for high resolution, serial fabrication of 3D structures of polymer brushes over millimeter length scales. With p‐DNL, 2D initiator templates consisting of arrays of nanolines and nanodots with rationally designed lateral spacings are fabricated in parallel via a locally tip‐induced nanodisplacement process, from which highly defined 3D polymer structures are grown via surface‐initiated atom transfer radical polymerization.