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Polymer Pen Lithography Using Dual‐Elastomer Tip Arrays
Author(s) -
Xie Zhuang,
Shen Youde,
Zhou Xuechang,
Yang Yong,
Tang Qing,
Miao Qian,
Su Jing,
Wu Hongkai,
Zheng Zijian
Publication year - 2012
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.201200849
Subject(s) - elastomer , materials science , lithography , soft lithography , polymer , nanotechnology , photolithography , composite material , optoelectronics , fabrication , medicine , alternative medicine , pathology
Dual‐elastomer tip arrays are developed as a simple and cost‐effective approach to significantly improve the uniformity and precision of polymer pen lithography (PPL). Both experiment and mechanical simulation demonstrate that the hard‐apex, soft‐base tip structure of the dual‐elastomer tip array leads to precise control of feature size and reduced variation among different tips over large areas through fine control of the tip deformation. The dual‐elastomer tip array is believed to be readily applied to fabricate nano‐ and microstructures for fundamental study and applications such as bioassays, sensors, optical and electronic devices.