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Electrochemically Induced Maskless Metal Deposition on Micropore Wall
Author(s) -
Liu Jie,
Hébert Clément,
Pham Pascale,
SauterStarace Fabien,
Haguet Vincent,
Livache Thierry,
Mailley Pascal
Publication year - 2012
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.201102327
Subject(s) - microporous material , electrolyte , materials science , electric field , chemical engineering , membrane , metal , deposition (geology) , nanotechnology , polarization (electrochemistry) , silicon , composite material , electrode , optoelectronics , chemistry , metallurgy , paleontology , biochemistry , physics , quantum mechanics , sediment , engineering , biology
By applying an external electric field across a micropore via an electrolyte, metal ions in the electrolyte can be reduced locally onto the inner wall of the micropore, which was fabricated in a silica‐covered silicon membrane. This maskless metal deposition on the silica surface is a result of the pore membrane polarization in the electric field.