New Design Concepts for the Fabrication of Nanometric Gap Structures: Electrochemical Oxidation of OTS Mono‐ and Bilayer Structures | Zendy

Druzhinina Tamara S. | Zendy; Hoeppener Stephanie | Zendy; Schubert Ulrich S. | Zendy

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New Design Concepts for the Fabrication of Nanometric Gap Structures: Electrochemical Oxidation of OTS Mono‐ and Bilayer Structures

Author(s) -

Druzhinina Tamara S.,

Hoeppener Stephanie,

Schubert Ulrich S.

Publication year - 2012

Publication title -

small

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 3.785

H-Index - 236

eISSN - 1613-6829

pISSN - 1613-6810

DOI - 10.1002/smll.201101842

Subject(s) - nanolithography , bilayer , nanotechnology , materials science , fabrication , octadecyltrichlorosilane , monolayer , lithography , electrochemistry , nanoparticle , membrane , chemistry , electrode , optoelectronics , medicine , biochemistry , alternative medicine , pathology

A reliable nanofabrication concept to engineer metallic nanometric gap structures and to incorporate silver nanoparticles within the gaps utilizing a combination of self‐assembly strategies and electrochemical oxidation lithography is developed. The approach uses the differences in oxidation kinetics of n ‐octadecyltrichlorosilane (OTS) monolayer and bilayer structures. The processes are investigated in detail and form the basis for a new nanofabrication process.

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