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New Design Concepts for the Fabrication of Nanometric Gap Structures: Electrochemical Oxidation of OTS Mono‐ and Bilayer Structures
Author(s) -
Druzhinina Tamara S.,
Hoeppener Stephanie,
Schubert Ulrich S.
Publication year - 2012
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.201101842
Subject(s) - nanolithography , bilayer , nanotechnology , materials science , fabrication , octadecyltrichlorosilane , monolayer , lithography , electrochemistry , nanoparticle , membrane , chemistry , electrode , optoelectronics , medicine , biochemistry , alternative medicine , pathology
A reliable nanofabrication concept to engineer metallic nanometric gap structures and to incorporate silver nanoparticles within the gaps utilizing a combination of self‐assembly strategies and electrochemical oxidation lithography is developed. The approach uses the differences in oxidation kinetics of n ‐octadecyltrichlorosilane (OTS) monolayer and bilayer structures. The processes are investigated in detail and form the basis for a new nanofabrication process.