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Hybrid Top‐Down and Bottom‐Up Fabrication Approach for Wafer‐Scale Plasmonic Nanoplatforms
Author(s) -
Dhawan Anuj,
Du Yan,
Batchelor Dale,
Wang HsinNeng,
Leonard Donovon,
Misra Veena,
Ozturk Mehmet,
Gerhold Michael D.,
VoDinh Tuan
Publication year - 2011
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.201002186
Subject(s) - fabrication , nanotechnology , plasmon , wafer , nanolithography , lithography , materials science , raman scattering , nanostructure , raman spectroscopy , optoelectronics , optics , physics , medicine , alternative medicine , pathology
A generalized hybrid nanofabrication approach is reported that combines top‐down (deep‐UV lithography) and bottom‐up (controlled lateral epitaxial growth) fabrication techniques for developing nanostructured platforms. This technology allows the development of reproducible substrates with controlled sub‐10‐nm gaps between plasmonic nanostructures over an entire 6 inch wafer. The plasmonic nanoplatforms are used for surface‐enhanced Raman scattering‐based detection of chemical and biological molecules.