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Continuous Measurement of Atomic Force Microscope Tip Wear by Contact Resonance Force Microscopy
Author(s) -
Killgore Jason P.,
Geiss Roy H.,
Hurley Donna C.
Publication year - 2011
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.201002116
Subject(s) - radius , substrate (aquarium) , atomic force microscopy , microscopy , materials science , silicon , nanotechnology , nanometre , resonance (particle physics) , resolution (logic) , microscope , nanoscopic scale , optics , composite material , computer science , optoelectronics , physics , geology , atomic physics , artificial intelligence , oceanography , computer security
Contact resonance force microscopy is used during AFM scanning to resolve instantaneous and progressive nanometer‐scale changes in the contact radius between an AFM tip and a silicon substrate. High‐resolution quantitative measurements of contact radius reveal real‐time information on wear rate, fracture, and tip‐symmetry.