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Flexible Replication Technique for High‐Aspect‐Ratio Nanostructures
Author(s) -
Szeghalmi Adriana,
Sklarek Kornelia,
Helgert Michael,
Brunner Robert,
Erfurth Wilfried,
Gosele Ulrich,
Knez Mato
Publication year - 2010
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.201000169
Subject(s) - materials science , polarizer , replication (statistics) , photonics , nanotechnology , replica , polystyrene , nanostructure , polymer , grating , nanolithography , atomic layer deposition , optoelectronics , layer (electronics) , optics , fabrication , birefringence , composite material , medicine , art , statistics , physics , mathematics , visual arts , alternative medicine , pathology
A flexible, nondestructive, and cost‐effective replication technique for nanostructures is presented. The advantages of the process are: 1) it allows for tailoring structural parameters of the replica (e.g., line width) nearly independent of the structural geometry of the master; 2) it allows for replication of high‐aspect‐ratio structures also in polymer materials from solution (especially noncurable polymers) such as polystyrene and polymethylmethacrylate; 3) it includes an easy separation process, thus preserving the master for repeated use. Linear grating replicas with line widths ranging from 88 to 300 nm are obtained using a single nanostructured master. Nanofibers and complex nanopatterned replicas are achievable. The presented technique and its flexibility show that atomic layer deposition is a unique tool for the preparation of high‐efficiency polarizer diffractive optics, photonics, electronics, and catalysts.