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Rapid Electrohydrodynamic Lithography Using Low‐Viscosity Polymers
Author(s) -
GoldbergOppenheimer Pola,
Steiner Ullrich
Publication year - 2010
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.201000060
Subject(s) - electrohydrodynamics , materials science , lithography , polymer , viscosity , nanotechnology , composite material , optoelectronics , chemistry , electrode
This study explores a number of low‐viscosity glass‐forming polymers for their suitability as high‐speed materials in electrohydrodynamic (EHD) lithography. The use of low‐viscosity polymer films significantly reduces the pattering time (to below 10 s) compared to earlier approaches, without compromising the high fidelity of the replicated structures. The rapid pace of this process requires a method to monitor the completion of EHD pattern formation. To this end, the leakage current across the device is monitored and the sigmoidal shape of the current curve is correlated with the various stages of EHD pattern formation.