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Mass Sensors: Small 2/2009
Author(s) -
Arcamone Julien,
Sansa Marc,
Verd Jaume,
Uranga Arantxa,
Abadal Gabriel,
Barniol Núria,
van den Boogaart Marc,
Brugger Juergen,
PérezMurano Francesc
Publication year - 2009
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.200990007
Subject(s) - stencil , materials science , deposition (geology) , nanometre , lithography , flux (metallurgy) , stencil lithography , nanotechnology , optics , optoelectronics , resist , layer (electronics) , physics , composite material , electron beam lithography , paleontology , sediment , metallurgy , biology , thermodynamics
Nanoelectromechanical mass sensors can be used to characterize material deposition rates in stencil lithography, report Francesc Perez‐Murano and co‐workers on p. 176 . The material flux through nanometer‐sized apertures is mapped with high spatial (below 1 µm) and deposition rate (below 10 pm s −1 ) resolutions by displacing the stencil apertures above the sensor. Material fluxes through apertures as small as 100 nm can be characterized using this technique.