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Matrix‐Assisted Dip‐Pen Nanolithography and Polymer Pen Lithography
Author(s) -
Huang Ling,
Braunschweig Adam B.,
Shim Wooyoung,
Qin Lidong,
Lim Jong Kuk,
Hurst Sarah J.,
Huo Fengwei,
Xue Can,
Jang JaeWon,
Mirkin Chad A.
Publication year - 2010
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.200901198
Subject(s) - nanotechnology , library science , engineering , materials science , computer science
The controlled patterning of nanomaterials presents a major challenge to the field of nanolithography because of differences in size, shape, and solubility of these materials. Matrix‐assisted dip‐pen nanolithography and polymer‐pen lithography provide a solution to this problem by utilizing a polymeric matrix that encapsulates the nanomaterials and delivers them to surfaces with precise control of feature size (see image).