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Reactive Ion Etching of Gold‐Nanoparticle‐Modified Pyrolyzed Photoresist Films
Author(s) -
Polsky Ronen,
Washburn Cody M.,
Montano Gabriel,
Liu Haiqing,
Edwards Thayne L.,
Lopez DeAnna M.,
Harper Jason C.,
Brozik Susan M.,
Wheeler David R.
Publication year - 2009
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.200901007
Subject(s) - photoresist , materials science , pyrolysis , reactive ion etching , nanoparticle , colloidal gold , etching (microfabrication) , chemical engineering , carbon fibers , nanotechnology , electrode , ion , composite material , chemistry , organic chemistry , layer (electronics) , composite number , engineering
Under similar electrodeposition conditions the unique surface properties of pyrolyzed photoresist films result in smaller gold nanoparticles with a higher density when compared to other common electrode materials. Reactive ion etching of such surfaces results in the formation of unique AuNP‐capped pyramidal carbon structures (see image).