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Solid‐to‐Hollow Single‐Particle Manipulation of a Self‐Assembled Luminescent NaYF 4 :Yb,Er Nanocrystal Monolayer by Electron‐Beam Lithography
Author(s) -
Feng Wei,
Sun LingDong,
Zhang YaWen,
Yan ChunHua
Publication year - 2009
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.200900404
Subject(s) - nanocrystal , monolayer , materials science , luminescence , nanotechnology , electron beam lithography , lithography , etching (microfabrication) , nanoparticle , particle (ecology) , quantum dot , self assembly , optoelectronics , layer (electronics) , resist , oceanography , geology
A hollow victory : Hollow‐sphere nanocrystals are fabricated by electron‐beam lithography in a self‐assembled luminescent NaYF 4 :Yb,Er nanocrystal monolayer (see picture). The formation mechanism is a heat‐induced inner acid‐etching process. Pattern formation can be achieved with single‐nanoparticle resolution. The 20‐nm β ‐NaYF 4 :Yb,Er nanocrystal monolayer acts as a data‐storage medium.