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Imprinting the Optical Near Field of Microstructures with Nanometer Resolution
Author(s) -
Kühler P.,
García de Abajo F. J.,
Solis J.,
Mosbacher M.,
Leiderer P.,
Afonso C.N.,
Siegel J.
Publication year - 2009
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.200900393
Subject(s) - materials science , optics , dielectric , light scattering , chalcogenide , laser , scattering , optoelectronics , near and far field , nanostructure , near field scanning optical microscope , optical microscope , nanotechnology , scanning electron microscope , physics , composite material
The imaging of complex 2D near‐field patterns imprinted on photosensitive films resulting from interference between laser light and light scattered by dielectric microspheres is demonstrated (see image). Using chalcogenide films, the imprint produces optical, electrical, and topographical contrast and allows the writing of erasable features as small as 10 nm. The technique is directly applicable to any type of scattering particle (size, shape, and material)