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A Simple Top‐Down/Bottom‐Up Approach to Sectored, Ordered Arrays of Nanoscopic Elements Using Block Copolymers
Author(s) -
Park Soojin,
Yavuzcetin Ozgur,
Kim Bokyung,
Tuominen Mark T.,
Russell Thomas P.
Publication year - 2009
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.200801573
Subject(s) - copolymer , materials science , nanoscopic scale , nanodot , polystyrene , annealing (glass) , lithography , electron beam lithography , nanopore , solvent , nanotechnology , chemical engineering , resist , polymer , composite material , optoelectronics , layer (electronics) , chemistry , organic chemistry , engineering
A top‐down/bottom‐up approach is demonstrated by combining electron‐beam (e‐beam) lithography and a solvent annealing process. Micellar arrays of polystyrene‐ block ‐poly(4‐vinylpyridine) (PS‐ b ‐P4VP) with a high degree of lateral order can be produced on a surface where sectoring is defined by e‐beam patterning. The e‐beam is used to crosslink the block copolymer (BCP) film immediately after spin‐coating when the BCP is disordered or in a highly ordered solvent‐annealed film. Any patterns can be written into the BCP by crosslinking. Upon exposure to a preferential solvent for the minor component block followed by drying, cylindrical nanopores are generated within the nonexposed areas by a surface reconstruction process, while, in the exposed areas, the films remain unchanged. Nickel nanodot arrays can be placed over selected areas on a surface by thermal evaporation and lift‐off process.