A Strategy for Patterning Conducting Polymers Using Nanoimprint Lithography and Isotropic Plasma Etching | Zendy

Huang Chunyu | Zendy; Dong Bin | Zendy; Lu Nan | Zendy; Yang Bingjie | Zendy; Gao Liguo | Zendy; Tian Lu | Zendy; Qi Dianpeng | Zendy; Wu Qiong | Zendy; Chi Lifeng | Zendy

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A Strategy for Patterning Conducting Polymers Using Nanoimprint Lithography and Isotropic Plasma Etching

Author(s) -

Huang Chunyu,

Dong Bin,

Lu Nan,

Yang Bingjie,

Gao Liguo,

Tian Lu,

Qi Dianpeng,

Wu Qiong,

Chi Lifeng

Publication year - 2009

Publication title -

small

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 3.785

H-Index - 236

eISSN - 1613-6829

pISSN - 1613-6810

DOI - 10.1002/smll.200801197

Subject(s) - nanoimprint lithography , materials science , nanotechnology , polymer , etching (microfabrication) , plasma etching , lithography , nanolithography , isotropy , photolithography , resist , optoelectronics , composite material , optics , fabrication , layer (electronics) , medicine , alternative medicine , pathology , physics

A method for decreasing the lateral size of conducting polymer patterns is demonstrated. Up to 15–70% shrinkage can be achieved based on nanoimprint lithography and isotropic plasma etching (see image). The conducting polymer patterns can direct the assembly of silver nanoparticles. This is a simple route for patterning high‐resolution conducting polymers.

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