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A Strategy for Patterning Conducting Polymers Using Nanoimprint Lithography and Isotropic Plasma Etching
Author(s) -
Huang Chunyu,
Dong Bin,
Lu Nan,
Yang Bingjie,
Gao Liguo,
Tian Lu,
Qi Dianpeng,
Wu Qiong,
Chi Lifeng
Publication year - 2009
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.200801197
Subject(s) - nanoimprint lithography , materials science , nanotechnology , polymer , etching (microfabrication) , plasma etching , lithography , nanolithography , isotropy , photolithography , resist , optoelectronics , composite material , optics , fabrication , layer (electronics) , medicine , alternative medicine , pathology , physics
A method for decreasing the lateral size of conducting polymer patterns is demonstrated. Up to 15–70% shrinkage can be achieved based on nanoimprint lithography and isotropic plasma etching (see image). The conducting polymer patterns can direct the assembly of silver nanoparticles. This is a simple route for patterning high‐resolution conducting polymers.