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Nanomechanical Mass Sensor for Spatially Resolved Ultrasensitive Monitoring of Deposition Rates in Stencil Lithography
Author(s) -
Arcamone Julien,
Sansa Marc,
Verd Jaume,
Uranga Arantxa,
Abadal Gabriel,
Barniol Núria,
van den Boogaart Marc,
Brugger Juergen,
PérezMurano Francesc
Publication year - 2009
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.200800699
Subject(s) - stencil , lithography , deposition (geology) , flux (metallurgy) , nanotechnology , materials science , stencil lithography , nanometre , optoelectronics , computer science , resist , computational science , layer (electronics) , electron beam lithography , geology , composite material , paleontology , sediment , metallurgy
A nanoelectromechanical mass sensor is used to characterize material deposition rates in stencil lithography. The material flux through nanometer‐sized apertures is mapped with high spatial (below 1 µm) and deposition‐rate (below 10 pm s −1 ) resolutions by displacing the stencil apertures above the sensor. It is concluded that material flux through apertures as small as 100 nm can be characterized.