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Fabrication of Silicon Nanopillar Teradot Arrays by Electron‐Beam Patterning for Nanoimprint Molds
Author(s) -
Wi JungSub,
Lee HyoSung,
Lim Kipil,
Nam SungWook,
Kim HyunMi,
Park SooYeon,
Lee Jae Jong,
Hong Chris Daehoon,
Jin Sungho,
Kim KiBum
Publication year - 2008
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.200800625
Subject(s) - nanopillar , nanoimprint lithography , materials science , electron beam lithography , fabrication , resist , nanodot , nanotechnology , nanolithography , trench , lithography , optoelectronics , silicon , nanostructure , layer (electronics) , medicine , alternative medicine , pathology
Critical issues that occur during the fabrication of high‐density nanostructures by e‐beam lithography are considered. A 25‐nm‐pitch Si nanopillar array and a 15‐nm‐pitch resist nanodot array are fabricated. Transfer of 1 teradot inch −2 patterns from the nanopillar array to a polymer surface is carried out by nanoimprint lithography (see picture).