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Cover Picture: Architectures from Aligned Nanotubes Using Controlled Micropatterning of Silicon Substrates and Electrochemical Methods (Small 7/2007)
Author(s) -
MuñozSandoval Emilio,
Agarwal Vivechana,
EscorciaGarcía José,
RamírezGonzález Daniel,
MartínezMondragón Maria M.,
CruzSilva Eduardo,
MenesesRodríguez David,
RodríguezManzo Julio A.,
Terrones Humberto,
Terrones Mauricio
Publication year - 2007
Publication title -
small
Language(s) - English
Resource type - Reports
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.200790021
Subject(s) - micropatterning , materials science , carbon nanotube , nanotechnology , silicon , etching (microfabrication) , chemical vapor deposition , electrochemistry , porous silicon , scanning electron microscope , nanotube , optoelectronics , electrode , composite material , chemistry , layer (electronics)
The cover picture shows scanning electron microscopy images of N‐doped carbon‐nanotube microarrays grown on electrochemically etched porous silicon substrates via a chemical vapor deposition process. Cactus‐ (top left), volcano‐ (top right), flower‐ (bottom left), and cake‐shaped (bottom right) microarrays were obtained depending on the electrochemical etching conditions used on the substrates. For more information, please read the Communication “Architectures from Aligned Nanotubes Using Controlled Micropatterning of Silicon Substrates and Electrochemical Methods” by M. Terrones and co‐workers, beginning on page 1157.