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Electron‐Beam‐Induced Deposition in Ultrahigh Vacuum: Lithographic Fabrication of Clean Iron Nanostructures
Author(s) -
Lukasczyk Thomas,
Schirmer Michael,
Steinrück HansPeter,
Marbach Hubertus
Publication year - 2008
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.200701095
Subject(s) - nanolithography , materials science , nanostructure , nanotechnology , electron beam induced deposition , fabrication , deposition (geology) , lithography , electron beam lithography , cathode ray , resist , electron , optoelectronics , transmission electron microscopy , medicine , paleontology , alternative medicine , scanning transmission electron microscopy , pathology , layer (electronics) , sediment , biology , physics , quantum mechanics
The generation of nanostructures with arbitrary shapes and well‐defined chemical composition is still a challenge and targets the core of the fast‐growing field of nanotechnology. One approach is the maskless nanofabrication technique of electron‐beam‐induced deposition (EBID). Up to now, the purity of these EBID structures has been rather poor. Here we demonstrate that by performing the EBID process solely under ultrahigh vacuum conditions, the lithographic generation of iron nanostructures on Si(100) with an unprecedented purity of higher than 95% is possible. One particular new aspect is the formation of EBID deposits with reduced size in a strain‐induced diffusive process, resulting in deposits significantly smaller than 10 nm.