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Optical Lithography with Printed Metal Mask and a Simple Superhydrophobic Surface
Author(s) -
Kim Taeil,
Baek Chang hoon,
Suh Kahp Y.,
Seo Soonmin,
Lee Hong H.
Publication year - 2008
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.200700882
Subject(s) - photoresist , resist , materials science , lithography , photolithography , substrate (aquarium) , optics , nanotechnology , x ray lithography , optoelectronics , layer (electronics) , oceanography , physics , geology
A nanolithographic optical patterning technique is presented. A metal pattern on a mold is transferred onto a photoresist on a substrate, then the resist with the printed metal mask is flood illuminated. The light passes through only the resist lenses that are formed in the transfer process. Focusing by these lenses results in a significant reduction in the feature size.