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TEM‐Based Metrology for HfO 2 Layers and Nanotubes Formed in Anodic Aluminum Oxide Nanopore Structures
Author(s) -
Perez Israel,
Robertson Erin,
Banerjee Parag,
HennLecordier Laurent,
Son Sang Jun,
Lee Sang Bok,
Rubloff Gary W.
Publication year - 2008
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.200700815
Subject(s) - nanopore , atomic layer deposition , materials science , nanotube , nanotechnology , nanodevice , nanostructure , anodizing , transmission electron microscopy , nanoporous , oxide , carbon nanotube , layer (electronics) , aluminium , composite material , metallurgy
Nanotubes are fabricated by atomic layer deposition (ALD) into nanopore arrays created by anodic aluminum oxide (AAO). A transmission electron microscopy (TEM) methodology is developed and applied to quantify the ALD conformality in the nanopores (thickness as a function of depth), and the results are compared to existing models for ALD conformality. ALD HfO 2 nanotubes formed in AAO templates are released by dissolution of the Al 2 O 3 , transferred to a grid, and imaged by TEM. An algorithm is devised to automate the quantification of nanotube wall thickness as a function of position along the central axis of the nanotube, by using a cylindrical model for the nanotube. Diffusion‐limited depletion occurs in the lower portion of the nanotubes and is characterized by a linear slope of decreasing thickness. Experimentally recorded slopes match well with two simple models of ALD within nanopores presented in the literature. The TEM analysis technique provides a method for the rapid analysis of such nanostructures in general, and is also a means to efficiently quantify ALD profiles in nanostructures for a variety of nanodevice applications.