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Self‐Templated Growth of Carbon‐Nanotube Walls at High Temperatures
Author(s) -
Huang JianYu,
Ding Feng,
Jiao Kun,
Yakobson Boris I.
Publication year - 2007
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.200700105
Subject(s) - carbon nanotube , materials science , annealing (glass) , nanotechnology , thickening , nanotube , layer (electronics) , chemical engineering , composite material , polymer science , engineering
A noncatalytic layer‐by‐layer self‐templated growth mechanism of carbon nanotube (CNTs) walls is presented. Growth occurs on both the inner and outer surfaces of the NTs. In both cases, the NT walls grow at the expense of disordered carbon or adatoms produced by electric breakdown (see image). The self‐templated growth results in thickening of the NT walls, reduction, or even disappearance of the NT hollow, and improvement of conductance. High‐temperature annealing improves the structure and electronic properties of CNTs.