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A “Molecular Eraser” for Dip‐Pen Nanolithography
Author(s) -
Jang JaeWon,
Maspoch Daniel,
Fujigaya Tsuyohiko,
Mirkin Chad A.
Publication year - 2007
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.200600679
Subject(s) - nanolithography , dip pen nanolithography , nanotechnology , nanostructure , atomic force microscopy , molecule , materials science , electrical conductor , computer science , chemistry , fabrication , composite material , organic chemistry , medicine , alternative medicine , pathology
The DPN eraser : Dip‐pen‐nanolithography‐ (DPN‐) generated nanostructures can be repaired using a conductive atomic force microscope (AFM) and an adsorbate‐coated AFM tip. This molecule‐based erasing technique was used to transform a pattern of MHA in the form of the letters “DRN” into “DPN” (see figure). The technique facilitates removal and subsequent backfilling with a second molecule type.