A “Molecular Eraser” for Dip‐Pen Nanolithography | Zendy

Jang JaeWon | Zendy; Maspoch Daniel | Zendy; Fujigaya Tsuyohiko | Zendy; Mirkin Chad A. | Zendy

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A “Molecular Eraser” for Dip‐Pen Nanolithography

Author(s) -

Jang JaeWon,

Maspoch Daniel,

Fujigaya Tsuyohiko,

Mirkin Chad A.

Publication year - 2007

Publication title -

small

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 3.785

H-Index - 236

eISSN - 1613-6829

pISSN - 1613-6810

DOI - 10.1002/smll.200600679

Subject(s) - nanolithography , dip pen nanolithography , nanotechnology , nanostructure , atomic force microscopy , molecule , materials science , electrical conductor , computer science , chemistry , fabrication , composite material , organic chemistry , medicine , alternative medicine , pathology

The DPN eraser : Dip‐pen‐nanolithography‐ (DPN‐) generated nanostructures can be repaired using a conductive atomic force microscope (AFM) and an adsorbate‐coated AFM tip. This molecule‐based erasing technique was used to transform a pattern of MHA in the form of the letters “DRN” into “DPN” (see figure). The technique facilitates removal and subsequent backfilling with a second molecule type.

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