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Low‐Ion‐Dose FIB Modification of Monomicellar Layers for the Creation of Highly Ordered Metal Nanodot Arrays
Author(s) -
Mela Petra,
Gorzolnik Blazej,
Bückins Matthias,
Mourran Ahmed,
Mayer Joachim,
Möller Martin
Publication year - 2007
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.200600338
Subject(s) - nanodot , materials science , nanotechnology , focused ion beam , lithography , monolayer , electron beam lithography , self assembly , optoelectronics , resist , ion , layer (electronics) , chemistry , organic chemistry
Creative writing : A low‐dose focused ion beam (FIB) is used to inscribe a pattern onto a monolayer of self‐assembled block‐copolymer/transition‐metal hybrid micelles to create arrays of gold nanodots. FIB lithography combines two different functional elements: hexagonally ordered nanodots created from the resist (see picture, right) and an underlying grating, which makes the nanodot arrays visible by optical microscopy (left).