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Wafer‐Scale Ni Imprint Stamps for Porous Alumina Membranes Based on Interference Lithography
Author(s) -
Lee Woo,
Ji Ran,
Ross Caroline A.,
Gösele Ulrich,
Nielsch Kornelius
Publication year - 2006
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.200600100
Subject(s) - interference lithography , fabrication , lithography , nanotechnology , materials science , wafer , schematic , interference (communication) , membrane , computer science , optoelectronics , engineering , chemistry , channel (broadcasting) , telecommunications , electrical engineering , medicine , biochemistry , alternative medicine , pathology
Stamp collection : Laser interference lithography can be used for the fabrication of master patterns with precise periodic nanostructures. Multiple copies of Ni imprint stamps can be replicated from a single master by an electrodeposition technique. The replicated stamps have been used for the fabrication of long‐range‐ordered anodic aluminum oxide membranes with a square or hexagonal pore arrangement (see schematic).