Wafer‐Scale Ni Imprint Stamps for Porous Alumina Membranes Based on Interference Lithography | Zendy

Lee Woo | Zendy; Ji Ran | Zendy; Ross Caroline A. | Zendy; Gösele Ulrich | Zendy; Nielsch Kornelius | Zendy

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Wafer‐Scale Ni Imprint Stamps for Porous Alumina Membranes Based on Interference Lithography

Author(s) -

Lee Woo,

Ji Ran,

Ross Caroline A.,

Gösele Ulrich,

Nielsch Kornelius

Publication year - 2006

Publication title -

small

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 3.785

H-Index - 236

eISSN - 1613-6829

pISSN - 1613-6810

DOI - 10.1002/smll.200600100

Subject(s) - interference lithography , fabrication , lithography , nanotechnology , materials science , wafer , schematic , interference (communication) , membrane , computer science , optoelectronics , engineering , chemistry , channel (broadcasting) , telecommunications , electrical engineering , medicine , biochemistry , alternative medicine , pathology

Stamp collection : Laser interference lithography can be used for the fabrication of master patterns with precise periodic nanostructures. Multiple copies of Ni imprint stamps can be replicated from a single master by an electrodeposition technique. The replicated stamps have been used for the fabrication of long‐range‐ordered anodic aluminum oxide membranes with a square or hexagonal pore arrangement (see schematic).

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