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Nanomachining by Colloidal Lithography
Author(s) -
Yang SeungMan,
Jang Se Gyu,
Choi DaeGeun,
Kim Sarah,
Yu Hyung Kyun
Publication year - 2006
Publication title -
small
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.785
H-Index - 236
eISSN - 1613-6829
pISSN - 1613-6810
DOI - 10.1002/smll.200500390
Subject(s) - lithography , nanotechnology , materials science , nanoscopic scale , dispersity , resist , etching (microfabrication) , photolithography , colloidal crystal , colloid , optoelectronics , chemical engineering , engineering , polymer chemistry , layer (electronics)
Colloidal lithography is a recently emerging field; the evolution of this simple technique is still in progress. Recent advances in this area have developed a variety of practical routes of colloidal lithography, which have great potential to replace, at least partially, complex and high‐cost advanced lithographic techniques. This Review presents the state of the art of colloidal lithography and consists of three main parts, beginning with synthetic routes to monodisperse colloids and their self‐assembly with low defect concentrations, which are used as lithographic masks. Then, we will introduce the modification of the colloidal masks using reactive ion etching (RIE), which produces a variety of nanoscopic features and multifaceted particles. Finally, a few prospective applications of colloidal lithography will be discussed.